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Nanonex
Nanoimprintor Family
Nanonex utilizes patented
Air Cushion PressTM to ensure maximum nanoimprint unformity. The
unique Smart Sample Holder design allows the handling of samples of different
sizes and irregular shapes. The full-wafer imprinting scheme enables a high
processing throughput.
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NX-2500,
Full-Wafer Imprintor with Alignment
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Full-wafer
(up to 8") nanoimprinting tool |
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Patented Air
Cushion PressTM (ACP) for ultimate nanoimprint uniformity
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Sub-micron
overlay alignment accuracy |
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User friendly alignment
scheme |
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Smart Sample Holder for
handling different sizes and irregular shapes |
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Applications in opto,
displays, biotechnologies, data storage, materials, ..., etc |
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Full-Wafer Imprintor with Alignment and Photolithography  | Full-wafer
(up to 8") nanoimprinting tool |  | All forms of nanoimprint and high resolution photolithography |  | Patented Air
Cushion PressTM (ACP) for ultimate nanoimprint uniformity |  | Sub-micron
overlay alignment accuracy and optical backside alignment (NX-2600BA) |  | User friendly alignment
scheme |  | Smart Sample Holder for
handling different sizes and irregular shapes |  | Applications in opto,
displays, biotechnologies, data storage, materials, ..., etc |
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NX-3000,
Step-and-Repeat Nanoimprintor With Alignment
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Step-and-repeat
nanoimprinting tool |
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Sub-micron
alignment accuracy |
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Enhanced Air
Cushion Press (EACP) ensuring uniformity over entire substrate |
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Photo-curable NIL,
upgradable to thermal curable |
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Integrated resist-drop
dispensing system |
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Sub-70 sec per imprint
field |
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Up to 8" SEMI standard
wafers |
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Applications in
semiconductors, micro-wave, opto, displays, bio, data storage, materials,...,
etc. |
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